Thermalengineering2bypakirappapdffree [UPD]
Thermalengineering2bypakirappapdffree
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.1. Field of the Invention
The present invention relates to a digital broadcast receiving apparatus for receiving and processing a signal of a digital broadcast for analog receivers which is the same as that of the present digital television broadcast (DTV), and a method for the same.
2. Description of the Related Art
In the analog broadcast wave, a frequency of 455 kHz±4 kHz is used for a DTV broadcasting channel. That is, a frequency of 455 kHz is used for a VHF channel, and a frequency of 466 kHz is used for a UHF channel. In the digital broadcast wave, however, a frequency band of 6 MHz is used for one channel. That is, a frequency of 636 kHz (channel 10) for a VHF channel, and a frequency of 662 kHz (channel 50) for a UHF channel, are used for a DTV broadcasting channel. Accordingly, the digital broadcast wave is provided by frequency up-converting the analog broadcast wave by the 2:1 ratio. Therefore, if the analog broadcast wave continues to be provided, unnecessary wave is included in a wave for the digital broadcast, and interference with the digital broadcast occurs.
In order to suppress interference with the digital broadcast, the U.S.A. (Federal Communications Commission) generally bans a UHF television receiving antenna having a horizontal aperture of 17 inches or more. Therefore, an antenna having the horizontal aperture of about 14 inches has been used in most of the households. Accordingly, the antenna has an antenna of small size. An RF-distribution circuit is generally placed below an antenna unit to reduce the size of the RF-distribution circuit. If the antenna of the horizontal aperture of about 14 inches is used, it is difficult to place the RF-distribution circuit below the antenna.
In particular, if the antenna having the horizontal aperture of about 14 inches is used as a receiving antenna, since the receiving antenna should be placed in the VHF band, a VHF antenna should be used. Accordingly, the receiving antenna can not be placed close to the TV set.
If an antenna of relatively small size such as an antenna having the horizontal aperture of about 11 inches is used as the receiving antenna, the receiving antenna can be placed near the TV set in a TV room. The RF-distribution
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How to Install Karbonn Team Ringtones APK on Huawei Honor 8 (GEMV8.11.3): Download Karbonn Team Ringtones APK from our website. Now install this APK. After installation tap on the new icon to activate the ringtone. Then enjoy all sounds. This ringtone is the best ringtone for Honor 8 (GEMV8.11.3).1. Field of the Invention The present invention relates to a device for cleaning dirty corners of a semiconductor-manufacturing apparatus, and more specifically to a device for cleaning such a corner which is disposed between a cleaning apparatus and a semiconductor-manufacturing apparatus, wherein the cleaning apparatus cleans the semiconductor-manufacturing apparatus in an atmosphere containing a reactive gas, wherein a gas such as a mixture of ozone and oxygen is supplied to the cleaning apparatus. The reactive gas, the mixture of ozone and oxygen, is a so-called ozone, which is reactive with organic substances. 2. Description of Related Art A prior art cleaning device for cleaning a semiconductor-manufacturing apparatus in an atmosphere containing a reactive gas is shown in Japanese Examined Patent Publication No. 62-3982. The cleaning device is composed of a first chamber for accommodating a semiconductor-manufacturing apparatus and a second chamber for accommodating a cleaning apparatus. A reactive gas, the mixture of ozone and oxygen, is supplied to the cleaning apparatus so as to clean the semiconductor-manufacturing apparatus in the atmosphere containing the reactive gas. However, in the prior art cleaning device for the semiconductor-manufacturing apparatus, because the cleaning apparatus is exposed to a reaction atmosphere, so-called polymer particles (resin particles), which are produced by a reaction between the reactive gas, the ozone and the organic substances (acid gas, alkali metal, etc.) which adhere to the semiconductor-manufacturing apparatus, are generated, so that the cleaning apparatus is subjected to significant wear. In order to prevent the cleaning apparatus from being subjected to significant wear, the reaction atmosphere must be suppressed. For example, to suppress the 0cc13bf012
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